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Spin Coater (8K rpm, 4" Wafer Max.) With 3 Vacuum Chuck
VTC-100 Vacuum Spin Coater is equipped with 3 vacuum chucks (for standard) of different sizes, and different vacuum chucks can be selected according to the size of samples. During working, VTC-100 vacuum spin coater uses vacuum plate adsorption method to fix the sample onto the sample plate. The equipment uses two-stage program to control the speed.
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Compact Spin Coater (8K rpm, 4" Wafer Max.) Low Chuck Deisgn
VTC-100B Vacuum Spin Coater is an upgraded version of VTC-100 vacuum spin coater. The upper cover folded for opening and closing, and is equipped with a safety lock. At the same time, it has the function of open-cover protection to better guarantee the safety of the operator.
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Programmable Vacuum Chuck Spin Coater (500-6000 rpm, 8" Max)
VTC-200 Vacuum Spin Coater has the advantages of simple operation, convenient cleaning and small size. It is mainly used in the film growing process in laboratories of colleges and universities and scientific research institutes. During working, VTC-200 vacuum spin coater uses vacuum plate adsorption method to fix the sample onto the sample plate. The equipment uses two-stage program to control the speed.
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Hi-Speed Spin Coater (10K rpm & 5" Max) With UV Cover
VTC-100PA-UV UV Spin Coater is suitable for semiconductor process, crystal, optical disc, plate making and surface coating, etc. The upper cover adopts UV light source and is especially suitable for materials sensitive to UV light, which can quickly solidify the coated film. In addition, the UV lamp also has a polymerization function, which can polymerize the monomer into a polymer film.
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Vacuumable And Atmospher Controlled Spin Coater
VTC-200PV Vacuum Spin Coater is suitable for semiconductor process, crystal, optical disc, plate making and surface coating, etc. The chamber of VTC-200PV vacuum spin coater can be vacuumized to coat the sample under completely vacuum condition, which is suitable for film materials that are easily oxidized and deteriorated in air. A clamp is used to fix the sample when the chamber is vacuumized. The equipment can store 12 sets of programs, and each set contains 6 running stages.
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