• Single Head High Vacuum Magnetron Plasma Sputtering Coater

    Single Head High Vacuum Magnetron Plasma Sputtering Coater

    VTC-600-1HD Single-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-1HD single-head magnetron sputtering coater is equipped with one target gun, choosing a strong magnetic target or a weak magnetic target.

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  • Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

    Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

    VTC-600-2HD Dual-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-2HD dual-head magnetron sputtering coater is equipped with two target guns and two power supplies, one RF power supply for sputter coating of non-conductive materials, and one DC power supply for sputter coating of conductive materials.

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  • Plasma Sputtering Coater With 3 Sputtering Sources

    Plasma Sputtering Coater With 3 Sputtering Sources

    VTC-600-3HD Threel-Head Magnetron Sputtering Coater is a coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-3HD three-head magnetron sputtering coater is equipped with three target guns, one RF power supply for sputter coating of non-conductive materials, and two DC power supplies for sputter coating of conductive materials.

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  • Plasma Sputtering Coater With 3 Sputtering Sources And Glove Box

    Plasma Sputtering Coater With 3 Sputtering Sources And Glove Box

    VGB-600-3HD Thin-Film Battery Preparation System can perform experimental operations in a glove box, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. The system is equipped with three target guns and one RF power supply for sputter coating of various target materials. The RF power supply can be connected to any target head by a transfer switch.

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  • Plasma Three-Target Sputtering Instrument

    Plasma Three-Target Sputtering Instrument

    1. The Three Target Plasma Sputtering Coater is equipped with a vacuum meter and a sputtering current meter, which can monitor the operation of the equipment at any time to achieve a stable and reliable coating effect. 2. The Three Target Plasma Sputtering Coater can adjust the vacuum chamber pressure, ionization current, and select the appropriate ionization gas through the sputtering current controller and the micro vacuum air valve to optimize the coating effect. 3. The specially designed bell jar edge rubber seal will not cause the glass bell jar to crack after long-term use, thereby improving the durability of the Three Target Plasma Sputtering Coater.

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  • Single Target Plasma Sputtering Coating Machine

    Single Target Plasma Sputtering Coating Machine

    1. The ceramic sealed high-voltage electrode joint of desktop plasma sputtering coater is more durable than the commonly used rubber seal. 2. According to the gas ionization characteristics in the electric field, desktop plasma sputtering coater uses a large-capacity sputtering vacuum chamber and a corresponding area sputtering target to make the sputtering coating more uniform and pure. 3. Desktop plasma sputtering coater has passed CE certification.

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