
High Vacuum Magnetron Plasma Sputtering Coater
1. The input power of the dual target magnetron sputtering coater is 220V/50Hz, and the inner diameter of the cavity is Ø300mm.
2. The target gun cooling method of the dual target magnetron sputtering coater adopts water cooling.
3. The gas filling system of the dual target magnetron sputtering coater uses a 2-way mass flow meter (1-way argon 100scc, 2-way argon 200scc). Special gases can be customized.
- Shenyang Kejing
- Shenyang, China
- 10 working days
- 50 sets
- Information
Introduction of dual head magnetron sputtering coater:
VTC-600-2HD-1000 Dual head magnetron sputtering coater is a high vacuum coating equipment newly developed by our company. It can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc. Dual head magnetron sputtering coater is equipped with two target guns and two power supplies, one RF power supply is used for sputtering coating of non-conductive materials, and one DC power supply is used for sputtering coating of conductive materials. Dual head magnetron sputtering coater can be equipped with strong magnetic targets for sputtering coating of ferromagnetic materials. Compared with similar equipment, dual head magnetron sputtering coater has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various material films in the laboratory.
Advantages of dual head magnetron plasma sputtering coater:
1. The dual head magnetron plasma sputtering coater is equipped with two target guns, one with an RF power supply for sputtering coating of non-conductive target materials, and the other with a DC power supply for sputtering coating of conductive materials.
2. The dual head magnetron plasma sputtering coater can prepare a variety of thin films and has a wide range of applications.
3. The dual head magnetron plasma sputtering coater is small in size and very easy to operate.
Technical parameters of dual target magnetron sputtering coater:
Product name | VTC-600-2HD-1000 Dual Head Magnetron Sputtering Coater |
Product model | VTC-600-2HD-1000 |
Installation conditions | This equipment is required to be used at a temperature of 25℃±15℃ and a humidity of 55%Rh±10%Rh. 1. Water: The equipment is equipped with a self-circulating cooling water machine (filled with pure water or deionized water) 2. Electricity: AC220V 50Hz, must be well grounded. 3. Gas: The equipment chamber needs to be filled with argon (purity above 99.99%), and you need to prepare your own argon gas cylinder (with Ø6mm double ferrule connector) and pressure reducing valve. 4. Workbench: size 1500mm×600mm×700mm, load-bearing capacity above 200kg. 5. Ventilation device: required. |
Main parameters | 1. Input power: 220V/50Hz. 2. Number of sputtering targets: 2. 3. Inner diameter of chamber: Ø300mm. 4. Cooling method of target gun: water cooling. 5. Ultimate vacuum degree: 9.0x10-4Pa. 6. Vacuum chamber specifications: Φ300×330 mm. 7. Vacuum system: VRD-16 mechanical pump FF-100/150 turbomolecular pump. 8. Restore vacuum: The system is pumped from the atmosphere to 5.0E-3pa≤30 min (the system is exposed to the atmosphere for a short time). 9. Inflating system: 2-way mass flow meter (1-way argon 100scc, 2-way argon 200scc) Special gases can be customized. 10. Sputtering target specifications: Φ2", thickness 0.1-5mm (thickness varies due to different target materials). 11. Sample stage: Φ140mm/rotatable (1-20rpm)/heatable (room temperature-1000℃). |
Product specifications | Host size: width 900mm × depth 650mm × height 1100mm |
About us:
Before the product leaves the factory, our staff will conduct comprehensive testing to ensure the accuracy and stability of the product. At the same time, we also have a professional after-sales service team. If you have any questions about the product, our team will answer you in time, so that your equipment can run stably for a long time.