Dual-Head High Vacuum Magnetron Plasma Sputtering Coater
Brand Shenyang Kejing
Product origin Shenyang, China
Delivery time 22 working days
Supply capacity 50 sets
VTC-600-2HD Dual-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-2HD dual-head magnetron sputtering coater is equipped with two target guns and two power supplies, one RF power supply for sputter coating of non-conductive materials, and one DC power supply for sputter coating of conductive materials.
Main Features
1. It is equipped with two target guns, one RF power supply is used for sputter coating of non-conductive materials, and one DC power supply is used for sputter coating of conductive materials.
2. A variety of thin films can be prepared with a wide range of applications.
3. Small size and easy to operate
Technical Parameters
Product Name | VTC-600-2HD Dual-Head Magnetron Sputtering Coater |
Product Model | VTC-600-2HD |
Installation Conditions | This equipment is required to be used at an altitude of 1000m or less, a temperature of 25℃±15℃, and a humidity of 55%Rh±10%Rh. 1. Water: The equipment is equipped with a self-circulating water cooler (filling with pure water or deionized water) 2. Electricity: AC220V 50Hz, must have good grounding 3. gas: The equipment chamber needs to be filled with argon gas (purity 99.99% or more), and argon gas cylinders (with Ø6mm double ferrule joints) and pressure reducing valve need to be provided by users. 4. Workbench: size 1500mm×600mm×700mm, bearing more than 200kg 5. Ventilation device: needed |
Major Parameters (Specification) | 1. Power supply voltage: 220V 50Hz 2. Power: 900W 3. Inner diameter of Chamber: Ø300mm 4. Limit of vacuum degree: 9.0×10-4Pa 5. Heating temperature of sample stage: RT-500℃, accuracy ±1℃ (Temperature can be increased according to actual needs.) 6. Number of target guns: 2 pcs (other quantities for option) 7. Cooling method of target gun: water cooling 8. Size of target material: Ø2″, thickness 0.1-5mm (different thicknesses due to different target materials) 9. DC sputtering power: 500W; RF sputtering power: 300W (The type of target power supply is optional, choosing two DC power supplies or two RF power supplies, or one DC power supply plus one RF power supply.) 10. Sample stage: Ø140mm, optional bias voltage function can be installed according to customer requirements to achieve higher quality of coating. 11. Speed of sample stage: adjustable within 1rpm-20rpm 12. Working gas: Ar and other inert gases 13. Intake air path: Mass flow meter controls 2 air-intake paths, one is 100SCCM and the other is 200SCCM. |
Product Dimension and Weight | 1. main machine dimension: 500mm×560mm×660mm 2. Overall dimension: 1300mm×660mm×1200mm 3. Vacuum chamber dimension: φ300×300mm 4. Weight: 160kg
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Standard Accessories | 1. DC Power Control System: 1 set 2. RF Power Control System: 1 set 3. Film Thickness Monitor System: 1 set 4. Molecular Pump (imported from Germany): 1 pcs 5. Water Cooler: 1 pcs 6. Polyester PU pipe (Ø6mm): 4m |
Optional Accessories | Various target materials such as gold, indium, silver, platinum, etc. |
Warranty
One year limited with lifetime support (not including rusted parts due to inadequate storage conditions)
Logistics
