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Compact and Efficient, a Must-have Coating Equipment for Laboratories
In the field of modern materials science and microscopic analysis, plasma sputtering technology is widely used in thin film deposition. Our Single Target Plasma Sputtering Coating Machine is efficient and accurate in practical applications. It also simplifies the operation of operators with its high performance, laying a foundation in the industry.
Single Target Plasma Sputtering Coating Machine can achieve sputtering coating of various metals such as gold, indium, platinum, silver, etc., and its height is adjustable. It can coat 8 SEM samples at the same time; the product can provide excellent coating uniformity and purity while ensuring the quality of the film layer.
Single Target Plasma Sputtering Coating Machine is equipped with a vacuum meter and a sputtering current meter. Users can monitor the working status in real time, and each step of the operation is carried out under the best conditions. By adjusting the sputtering current controller and the micro vacuum air valve, the operator can accurately control the pressure and ionization current of the vacuum chamber to obtain the ideal coating effect.
Our company has been designing and producing this Single Target Plasma Sputtering Coating Machine for many years. We have high-level technology, experienced staff and considerate service. If you are interested in our products, please feel free to contact us.