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How does Plasma Sputter and Carbon Evaporating Coating Machine Improve Sample Preparation Efficiency?
Electron microscope technology continues to advance, and scanning electron microscopes (SEM) are increasingly used in materials science, biology, and nanotechnology. In order to ensure the quality of SEM images, high-quality metal or carbon film coatings are required during sample preparation. Traditional coating equipment often faces problems such as complex operation and uneven film layers, which brings a lot of trouble to scientific researchers. How to improve the efficiency and convenience of sample preparation while ensuring the quality of the film layer has become the focus of attention of relevant staff.
Our GSL-1100X-SPC-16C Plasma Sputter and Carbon Evaporating Coating Machine, as a professional multi-functional equipment, integrates ion sputtering and thermal evaporation carbon film functions. It is not only easy to operate, but also has excellent film-forming effects, which can meet the needs of a variety of sample preparation.
Plasma Sputter and Carbon Evaporating Coating Machine adopts advanced discharge technology, combined with automatic control circuits, which can accurately control vacuum pressure ionization current and gas selection, so that the film deposition is uniform, fast, and controllable, meeting the needs of different laboratories. The equipment is also specially designed with adjustable sputtering current and vacuum chamber pressure. Users can flexibly control the equipment according to different needs to further optimize the sample preparation process.
At the same time, plasma Sputter and Carbon Evaporating Coating Machine supports a variety of target materials, including gold, indium, silver, platinum and other target materials, which are particularly suitable for gold spraying or gold evaporation and carbon evaporation on the surface of scanning electron microscope samples. During use, a finer particle coating can be obtained, and the thermal evaporation part can also quickly deposit high-quality carbon film in a more uniform and delicate way, which greatly improves the surface quality of the sample and provides an ideal sample preparation basis for various tasks.
In order to further simplify the operation, the product is also equipped with a manual start button. Users can pre-set the vacuum chamber pressure and sputtering current to avoid unnecessary film damage. In addition, the vacuum protection mechanism can prevent the equipment from short-circuiting due to low vacuum, which provides a guarantee for the safe operation of the equipment.
Whether you are in a scientific research institute, a university laboratory, or in the field of high-end industrial research, this product can match your needs for equipment, stable, safe and efficient. Welcome to consult the product, our customer service team will be at your service at any time.