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On the basis of basic magnetron sputtering,high vacuum and high temperature growth environment are introduced, and plasma technology is combined to improve the reaction efficiency of reactive deposition, so as to realize magnetron sputtering film epitaxy. The film prepared under this high vacuum condition has a better lattice orientation and more outstanding crystal properties. It has a wide range of applications in superconducting quantum, ferroelectric materials, piezoelectric materials, thermoelectric materials and other fields. The high vacuum state helps to reduce the influence of impurities and ensure that the sputtered particles do not react adversely with other gases during the deposition process.