Three-target Magnetron Sputtering Instrument
1. The three-target coating equipment has high precision, small result error, and more peace of mind during use.
2. The three-target coating equipment is easy to operate and reduces learning time.
3. The three-target coating equipment is suitable for a variety of materials, reducing the consumption of multiple equipment.
- Shenyang Kejing
- Shenyang, China
- 10 working days
- 50 sets
- Information
Introduction of three-target vacuum coating equipment:
VTC-600-3HD-1000 Three-target vacuum coating equipment is a high-vacuum coating equipment newly developed by our company. It can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc. VTC-600-3HD-1000 Three-target vacuum coating equipment is equipped with three target guns and three power supplies, one RF power supply is used for sputtering coating of non-conductive materials, one DC power supply is used for sputtering coating of conductive materials, and a strong magnetic target can be used for sputtering coating of ferromagnetic materials. Compared with similar equipment, Three-target vacuum coating equipment has the advantages of small size and easy operation, and a wide range of materials can be used. It is an ideal equipment for preparing various material films in the laboratory.
Main features of High-Vacuum Triple Target Sputter Coater:
1. High-Vacuum Triple Target Sputter Coater is equipped with three target guns, two matching RF power supplies are used for sputtering coating of non-conductive target materials, and one matching DC power supply is used for sputtering coating of conductive materials.
2. High-Vacuum Triple Target Sputter Coater can prepare a variety of thin films and is widely used.
3. High-Vacuum Triple Target Sputter Coater is small in size and easy to operate.
Technical parameters of the three-target coating equipment:
| Product name | VTC-600-3HD-1000 Dual-target Magnetron Sputtering Instrument |
Product model | VTC-600-3HD-1000 |
Main parameters | 1. Input power: 220V/50Hz. 2. Number of sputtering targets: 3. 3. Inner diameter of chamber: Ø300mm. 4. Cooling method of target gun: water cooling. 5. Ultimate vacuum degree: 7.4E-5pa. 6. Vacuum chamber specifications: Φ300×330 mm. 7. Vacuum system: VRD-16 mechanical pump FF-100/150 turbomolecular pump. 8. Restore vacuum: The system is pumped from the atmosphere to 5.0E-3pa≤30 min (the system is exposed to the atmosphere for a short time). 9. Inflating system: 2-way mass flow meter (1 way argon 100scc, 1 way argon 200scc) Special gas can be customized. 10. Sputtering target specifications: Φ2", thickness 0.1-5mm (the thickness varies due to different target materials). 11. Sample stage: Φ70mm//heatable (room temperature ~ 1000℃). |
Product Specifications | Host size: width 900mm × depth 650mm × height 1100mm |
Warranty：
One year limited with lifetime support (not including rusted parts due to inadequate storage conditions).
Logistics
About us:
Our company has been deeply involved in the film making field for many years and has superb experience. At the same time, our company has a variety of equipment suitable for different materials to meet your various needs. We can also help you test the effect of the equipment. You can provide samples and we will prepare samples to let you see the effect of our products more intuitively. If you approve of our products, you can buy them and let you carry out your work more smoothly.
