Spherical Pulsed Laser Deposition System
Brand Shenyang Kejing
Product origin Shenyang, China
Delivery time 44 working days
Supply capacity 50 sets
This system is a research and development equipment for spherical pulsed laser deposition system (PLD). Pulsed laser deposition technology is widely used, and can be used to prepare thin films of various substances such as metals, semiconductors, oxides, nitrides, carbides, borides, silicides, sulfides and fluorides. It is even used to prepare some difficult-to-synthesize material films, such as diamond and cubic nitride films.
Technical Parameters
Product name | Spherical Pulsed Laser Deposition System (PLD) |
Installation Conditions | 1. Ambient temperature: 10℃～35℃ 2. Relative humidity: no more than 75% 3. Power supply: 220V, single-phase, 50±0.5 Hz 4. Equipment power: less than 4KW 5. Water supply: water pressure of 0.2MPa～0.4MPa, water temperature of 15℃～25℃, 6. The surrounding environment of the equipment should be tidy, the air should be clean, and there should be no dust or gas that can cause corrosion on electric appliance or other metal surface or cause conduction between metals. |
Major Parameters (Specification) | 1. The system adopts a spherical structure and manual front door. 2. The vacuum chamber components and accessories are all made of high-quality stainless steel (304), argon arc welding, and the surface is treated with glass blasting and electrochemical polishing and passivating. 3. The vacuum chamber is equipped with a visual observation window. The effective size of the vacuum chamber is Φ300mm. 4. Limit of vacuum degree: ≤6.67×10-5Pa (After baking and degassing, use 600L/S molecular pump to pump air, and use 8L/S for the front stage); Leak rate of system vacuum leak detection: ≤5.0×10-7Pa.L/S; The system starts to pump air from the atmosphere to 8.0×10-4 Pa, which can be reached in 40 minutes; the vacuum degree after the pump is stopped for 12 hours: ≤20 Pa 5. Sample stage: the sample size is φ40mm, the rotation speed is 1-20RPM, and the distance between the substrate stage and the rotation target is 40-90mm. 6. The maximum heating temperature of sample: 800℃, temperature control accuracy: ±1℃, and the temperature control meter is used for temperature control. 7. Four-station rotation target: each target position is φ40mm, only one target position is exposed on the baffle/shutter, the laser beam is required to hit the top target position, and the rotation target has the functions of revolution and autorotation. 8. Baking, illuminating and water pressure alarm devices are installed in the vacuum chamber 9. MFC one-way mass flow meter ( to control the intake air): 0-100sccm |
Warranty
One year limited with lifetime support (not including rusted parts due to inadequate storage conditions)
Logistics
